Chemical Vapor Deposition (CVD) Furnace
Chemical vapour deposition furnaces (or CVD furnaces) are used to create a thin layer or deposit, protecting mechanical parts from corrosion or oxidation. Labec CVD furnaces use a horizontal tube furnace system and three way gas control system, available in varying tube sizes and operating temperatures of +1700ºC.
Frequently Asked Questions
What is a CVD furnace?
A CVD (Chemical Vapour Deposition) furnace is used to deposit thin films from a gas state (vapour) to a solid state on a substrate through chemical reactions.
How does chemical vapour deposition work?
Chemical vapour deposition involves gases reacting or decomposing on a heated substrate, creating a solid material that coats the substrate.
How does a CVD machine work?
A CVD furnace heats a substrate and introduces gas-phase chemicals. These chemicals react or decompose on the substrate’s surface, forming a solid layer.
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What is an example of a chemical vapour deposition?
An example of chemical vapour deposition is creating a thin film of silicon carbide on silicon wafers (substrate) used in semiconductor devices.